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deposition of coating

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См. также в других словарях:

  • Coating — is a covering that is applied to the surface of an object, usually referred to as the substrate. In many cases coatings are applied to improve surface properties of the substrate, such as appearance, adhesion, wetability, corrosion resistance,… …   Wikipedia

  • coating — dengimas statusas T sritis fizika atitikmenys: angl. coating; deposition vok. Auftragung, f; Bedeckung, f; Beschichtung, f rus. нанесение, n; покрытие, n pranc. dépôt, m; gainage, m; revêtement, m …   Fizikos terminų žodynas

  • deposition — dengimas statusas T sritis fizika atitikmenys: angl. coating; deposition vok. Auftragung, f; Bedeckung, f; Beschichtung, f rus. нанесение, n; покрытие, n pranc. dépôt, m; gainage, m; revêtement, m …   Fizikos terminų žodynas

  • Electrophoretic deposition — (EPD), is a term for a broad range of industrial processes which includes electrocoating, cathodic electrodeposition, and electrophoretic coating, or electrophoretic painting. A characteristic feature of this process is that colloidal particles… …   Wikipedia

  • Vacuum deposition — Not to be confused with Vacuum coating. Vacuum deposition is a family of processes used to deposit layers atom by atom or molecule by molecule at sub atmospheric pressure (vacuum) on a solid surface. The layers may be as thin as one atom to… …   Wikipedia

  • PCC Coating — Pyrolytic Chromium Carbide Coating is a technology for protection and reworking of rapidly wearing parts of manufacturing equipment working in extreme environmental conditions, using vacuum deposition technology. Coating mechanical parts can help …   Wikipedia

  • Pyrolytic chromium carbide coating — (PCC) is a technology for protection and reworking of rapidly wearing parts of manufacturing equipment working in extreme environmental conditions, using vacuum deposition technology. Coating mechanical parts can help with problems of corrosion,… …   Wikipedia

  • Sputter deposition — is a physical vapor deposition (PVD) method of depositing thin films by sputtering, that is ejecting, material from a target, that is source, which then deposits onto a substrate, such as a silicon wafer. Resputtering is re emission of the… …   Wikipedia

  • Chemical vapor deposition — DC plasma (violet) enhances the growth of carbon nanotubes in this laboratory scale PECVD apparatus. Chemical vapor deposition (CVD) is a chemical process used to produce high purity, high performance solid materials. The process is often used in …   Wikipedia

  • Electron beam physical vapor deposition — or EBPVD is a form of physical vapor deposition in which a target anode is bombarded with an electron beam given off by a charged tungsten filament under high vacuum. The electron beam causes atoms from the target to transform into the gaseous… …   Wikipedia

  • Physical vapor deposition — (PVD) is a variety of vacuum deposition and is a general term used to describe any of a variety of methods to deposit thin films by the condensation of a vaporized form of the material onto various surfaces (e.g., onto semiconductor wafers). The… …   Wikipedia

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